DocumentCode
3212677
Title
Considerations When Applying Microprocessor Relays In Chemically Harsh Environments
Author
Wester, Craig ; Midence, Rene ; Cosoreanu, Claudia
Author_Institution
GE Multilin, Norcross
fYear
2007
fDate
24-28 June 2007
Firstpage
19
Lastpage
24
Abstract
The evolution of microprocessor based protection, monitoring, and control devices in industrial applications has resulted from a need for smaller, more cost effective protection devices that can provide substantially more metering, monitoring, and reporting functionality than electro-mechanical or solid-state relays. These requirements have led to the use of surface mount components, replacing the larger, more expensive through-hole components. While helping to meet the requirements of the industrial market, the use of surface mount (SMT) technology has produced technical challenges directly related to the industrial environment for which they were designed. Harsh chemical environments, specifically environments that contain gaseous sulphide, can result in the corrosion and ultimate failure of the surface mount components used to manufacture microprocessor-based devices. Although the terminology "Harsh Chemical Environment" is commonly used to describe applications known to contain chemical contamination, it has been established that the levels of hydrogen sulphide (H2S) required to cause failures in surface mount components is scientifically lower than previously thought. This paper will serve to highlight the technical challenges associated with implementing microprocessor-based devices in industrial environments where there is the potential for hydrogen sulphide or other corrosive gas contamination. Among the issues to be discussed; (a) how hydrogen sulphide effects microprocessor based devices; (b) sources and levels of hydrogen sulphide causing component failure; and (c) prevention and containment solutions for industrial applications.
Keywords
contamination; corrosion; failure analysis; hydrogen compounds; relay protection; surface mount technology; chemical contamination; chemically harsh environments; component failure; corrosion; gaseous sulphide; hydrogen sulphide; microprocessor relays; protection devices; surface mount components; surface mount technology; ultimate failure; Chemicals; Hydrogen; Manufacturing industries; Microprocessors; Monitoring; Protection; Protective relaying; Relays; Surface contamination; Surface-mount technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulp and Paper Industry Technical Conference, 2007. Conference Record of Annual
Conference_Location
Williamsburg, VA
ISSN
0190-2172
Print_ISBN
1-4244-1192-0
Electronic_ISBN
0190-2172
Type
conf
DOI
10.1109/PAPCON.2007.4286279
Filename
4286279
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