DocumentCode :
3213281
Title :
Layout design dependence of NBTI for I/O p-MOSFET
Author :
Kol´dyaev, Victor
Author_Institution :
PDF/Solutions, San Jose, CA, USA
fYear :
2004
fDate :
25-29 April 2004
Firstpage :
663
Lastpage :
664
Abstract :
Every VLSI product has some distributions of I/O p-MOSFET design with respect to the channel lengths and widths. For reliability evaluation the most vulnerable design is to be chosen. To do this there is a need to investigate a layout dependence of NBTI for I/O pMOSFET being the most weak among all others types of logic transistors. The study has resulted in the right choice of the transistors for NBTI routing testing, process optimization to improve the NBTI and to find the right spec for the product qualification.
Keywords :
MOSFET; VLSI; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; semiconductor device testing; I/O p-MOSFET; NBTI; channel lengths; channel widths; layout design dependence; most vulnerable design; process optimization; reliability evaluation; Annealing; CMOS logic circuits; Degradation; MOSFET circuits; Niobium compounds; Silicon; Testing; Threshold voltage; Titanium compounds; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN :
0-7803-8315-X
Type :
conf
DOI :
10.1109/RELPHY.2004.1315440
Filename :
1315440
Link To Document :
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