• DocumentCode
    3213281
  • Title

    Layout design dependence of NBTI for I/O p-MOSFET

  • Author

    Kol´dyaev, Victor

  • Author_Institution
    PDF/Solutions, San Jose, CA, USA
  • fYear
    2004
  • fDate
    25-29 April 2004
  • Firstpage
    663
  • Lastpage
    664
  • Abstract
    Every VLSI product has some distributions of I/O p-MOSFET design with respect to the channel lengths and widths. For reliability evaluation the most vulnerable design is to be chosen. To do this there is a need to investigate a layout dependence of NBTI for I/O pMOSFET being the most weak among all others types of logic transistors. The study has resulted in the right choice of the transistors for NBTI routing testing, process optimization to improve the NBTI and to find the right spec for the product qualification.
  • Keywords
    MOSFET; VLSI; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; semiconductor device testing; I/O p-MOSFET; NBTI; channel lengths; channel widths; layout design dependence; most vulnerable design; process optimization; reliability evaluation; Annealing; CMOS logic circuits; Degradation; MOSFET circuits; Niobium compounds; Silicon; Testing; Threshold voltage; Titanium compounds; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
  • Print_ISBN
    0-7803-8315-X
  • Type

    conf

  • DOI
    10.1109/RELPHY.2004.1315440
  • Filename
    1315440