DocumentCode
3213281
Title
Layout design dependence of NBTI for I/O p-MOSFET
Author
Kol´dyaev, Victor
Author_Institution
PDF/Solutions, San Jose, CA, USA
fYear
2004
fDate
25-29 April 2004
Firstpage
663
Lastpage
664
Abstract
Every VLSI product has some distributions of I/O p-MOSFET design with respect to the channel lengths and widths. For reliability evaluation the most vulnerable design is to be chosen. To do this there is a need to investigate a layout dependence of NBTI for I/O pMOSFET being the most weak among all others types of logic transistors. The study has resulted in the right choice of the transistors for NBTI routing testing, process optimization to improve the NBTI and to find the right spec for the product qualification.
Keywords
MOSFET; VLSI; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; semiconductor device testing; I/O p-MOSFET; NBTI; channel lengths; channel widths; layout design dependence; most vulnerable design; process optimization; reliability evaluation; Annealing; CMOS logic circuits; Degradation; MOSFET circuits; Niobium compounds; Silicon; Testing; Threshold voltage; Titanium compounds; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN
0-7803-8315-X
Type
conf
DOI
10.1109/RELPHY.2004.1315440
Filename
1315440
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