Statistical latency analysis of carbon nanotube interconnects due to contact resistance variations

Single walled carbon nanotubes (SWCNTs) and bundled CNTs have emerged as promising candidates for future VLSI interconnects material due to their excellent inherent electrical and thermal properties. The work in this paper attempts to statistically analyse the effect of process variation in contact resistance on the interconnect delay by using Monte-Carlo method. The work in this paper attempts to statistically analyse the effect of process variation in contact resistance on the latency of CNT interconnect using Monte-Carlo method. This paper makes an effort to evaluate the suitability of SWCNTs and bundled CNTs as futuristic VlSI interconnects in par with ITRS predictions with its inherent process variations in the contact resistance value. It is found that bundled CNTs can offer better performance than prediction and the performance of SWCNTs are getting highly limited by contact resistance variations.