• DocumentCode
    3214156
  • Title

    Low Cost, Tailored Polymer-Metal Nanocomposites for Advanced Electronic Applications

  • Author

    Biswas, Abhijit ; Karulkar, Pramod C.

  • Author_Institution
    Alaska Univ., Fairbanks
  • fYear
    2006
  • fDate
    25-28 June 2006
  • Firstpage
    145
  • Lastpage
    149
  • Abstract
    The primary purpose of this paper is to introduce a nanomaterials fabrication facility that has recently been set up at the University of Alaska Fairbanks´ Office of Electronic Miniaturization (OEM). The secondary purpose is to outline our research programs on nanoengineered materials for advanced electronic applications. We present a versatile, simple, and single-step high-vacuum e-beam codeposition technique for the controlled fabrication of nanostructured materials. The method allows evaporation of up to four different polymers, metals, semiconductors, insulators, and ceramics simultaneously or sequentially. Film properties can be controlled by controlling a number of deposition conditions. The system can be switched over rapidly to use a different set of materials. The process has a great potential to produce materials for many different practical applications for both R&D and scaled-up pilot production. This is the first nanomaterial fabrication facility of its kind in the State of Alaska and provides exciting opportunities for university-government- industry-collaboration that will be highlighted.
  • Keywords
    electron beam deposition; evaporation; nanocomposites; nanoelectronics; polymers; advanced electronic applications; film properties; high-vacuum e-beam codeposition technique; nanoengineered materials; nanomaterial fabrication facility; nanostructured materials; polymer-metal nanocomposites; Ceramics; Costs; Fabrication; Metal-insulator structures; Nanocomposites; Nanomaterials; Nanostructured materials; Plastic insulation; Polymers; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Microelectronics Symposium, 2006 16th Biennial
  • Conference_Location
    San Jose, CA
  • ISSN
    0749-6877
  • Print_ISBN
    1-4244-0267-0
  • Type

    conf

  • DOI
    10.1109/UGIM.2006.4286370
  • Filename
    4286370