DocumentCode
3214572
Title
Deposition and characterization of ZnO:Al thin films by ultrasonic spray pyrolysis
Author
Babu, B.J. ; Maldonado, A. ; Velumani, S.
Author_Institution
Dept. de Ing. Electr.-SEES, CINVESTAV-IPN, Mexico City, Mexico
fYear
2009
fDate
10-13 Jan. 2009
Firstpage
1
Lastpage
5
Abstract
Al-doped ZnO (AZO) thin films were prepared using simple, flexible and cost-effective ultrasonic spray pyrolysis (USP) technique at different substrate temperatures. Zinc acetate dehydrate (Zn (CH3COO)2.2H2O) and Aluminum acetylacetonate (C15H21AlO6) were used as precursors and the solvent was a mixture of de-ionized water, methanol and acetic acid. Substrate temperatures are varied for 3 at% Al-doped film between 450°C to 500°C. The film´s structural, optical and electrical properties were investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), UV-VIS transmittance spectroscopy, photoluminescence (PL) and Hall measurements. The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. Grain sizes varied from 21.3 to 25.3 nm based on substrate temperature. FESEM images revealed that the film morphology is strongly affected by the substrate temperature. Transmission measurements showed that for visible wavelength (400-700 nm), the AZO films have an average transmission of 75%. Optical band gap of AZO films is varied from 3.26 to 3.29 eV with the increase in substrate temperature. PL spectra showed ZnO:Al films with a low density of native defects. Resistivity of the films varied from 0.7 Ohm-cm to 2 à 10-2 Ohm-cm. Minimum electrical resistivity was obtained for film deposited at 475°C with film thickness of 602 nm.
Keywords
Hall effect; II-VI semiconductors; X-ray diffraction; aluminium; electrical resistivity; energy gap; field emission electron microscopy; grain size; photoluminescence; pyrolysis; scanning electron microscopy; semiconductor growth; semiconductor thin films; spray coating techniques; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; FESEM image; Hall measurement; UV-VIS transmittance spectroscopy; X-ray diffraction; ZnO:Al; acetic acid; deionized water; electrical property; electrical resistivity; field emission scanning electron microscopy; film morphology; hexagonal wurtzite structure; methanol acid; optical band gap; optical property; photoluminescence; polycrystalline; size 21.3 nm to 25.3 nm; solvent; structural property; substrate temperature; temperature 450 C to 500 C; thin film deposition; ultrasonic spray pyrolysis; Aluminum; Optical films; Optical microscopy; Solvents; Spraying; Sputtering; Substrates; Temperature; Transistors; Zinc oxide; AZO; EDX; FESEM; PL; USP; UV-VIS; XRD;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Engineering, Computing Science and Automatic Control,CCE,2009 6th International Conference on
Conference_Location
Toluca
Print_ISBN
978-1-4244-4688-9
Electronic_ISBN
978-1-4244-4689-6
Type
conf
DOI
10.1109/ICEEE.2009.5393563
Filename
5393563
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