DocumentCode
32149
Title
Mono-Like Silicon Growth Using Functional Grain Boundaries to Limit Area of Multicrystalline Grains
Author
Kutsukake, Kentaro ; Usami, Noritaka ; Ohno, Y. ; Tokumoto, Yuki ; Yonenaga, Ichiro
Author_Institution
Tohoku Univ., Sendai, Japan
Volume
4
Issue
1
fYear
2014
fDate
Jan. 2014
Firstpage
84
Lastpage
87
Abstract
We propose a new growth method for mono-like silicon (Si): the suppression of multicrystallization using functional grain boundaries artificially formed by multiseed crystals. In our previous study, we demonstrated such suppression in an ingot 30 mm in diameter. In this paper, we grew mono-like Si ingots of 100 and 400 mm on a side. Functional grain boundaries successfully suppressed the increase in the area of multicrystalline grains nucleated on crucible side walls, which indicates a large volume of quasi-monocrystalline Si up to the top of the ingots. This enables a large increase in the yield of quasi-monocrystalline wafers in an ingot and would lead to a reduction in the cost of the solar cells.
Keywords
crystal growth; crystallisation; elemental semiconductors; grain boundaries; nucleation; semiconductor growth; silicon; Si; crucible side walls; functional grain boundaries; mono-like silicon growth; multicrystalline grains; multicrystallization; multiseed crystals; nucleation; quasimonocrystalline wafers; size 100 mm; size 400 mm; solar cells; Educational institutions; Grain boundaries; Photovoltaic cells; Photovoltaic systems; Silicon; Crystal growth; grain boundary (GB); mono-cast; mono-like Si; multicrystalline Si; quasi-mono; seeded cast;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2013.2281730
Filename
6615989
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