Dual frequency plasma enhanced chemical vapor deposition of diamond like carbon

Author

Hosseini, S.I. ; Shokri, B. ; Malekfar, A. ; Sharifian, M.

Author_Institution

G.C., Laser & Plasma Res. Inst., Shahid Beheshti Univ., Tehran, Iran

fYear

2009

fDate

1-5 June 2009

Firstpage

1

Lastpage

1

Abstract

Summary form only given: Diamond like carbon (DLC) is deposited by dual frequency PECVD. It consists of a surface wave coupled microwave (MW) at 2.45 GHz and capacitively coupled radio frequency (RF) at 34 MHz. By using this method in addition to depositing DLC films at low temperature, we can control key parameters of the system independently. These parameters are the energy of ions reaching on the surface and the density of radicals and ions. We uses CH4 and H2 which the former is injected to the RF part and hydrogen plasma is produced by MW section. SEM and AFM are used to ascertaining the quality of the films.

Keywords

atomic force microscopy; diamond-like carbon; plasma CVD; plasma density; scanning electron microscopy; thin films; AFM; C; SEM; diamond like carbon; dual frequency plasma enhanced chemical vapor deposition; frequency 34 MHz to 2.45 GHz; hydrogen plasma; ion density; ion energy; surface wave coupled microwave; Chemical vapor deposition; Control systems; Diamond-like carbon; Hydrogen; Plasma chemistry; Plasma temperature; Plasma waves; Radio frequency; Surface waves; Temperature control;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on

Conference_Location

San Diego, CA

ISSN

0730-9244

Print_ISBN

978-1-4244-2617-1

Type

conf

DOI

10.1109/PLASMA.2009.5227495

Filename

5227495