Title :
Chip Improvements for Future IGBT Modules
Author :
Donlon, John F. ; Motto, Eric R. ; Takahashi, Tetsuo ; Fujii, Hidenori ; Satoh, Katsumi
Author_Institution :
Powerex, Inc., Youngwood, PA
Abstract :
Since the introduction of the IGBT module, improvements in power loss have been achieved by applying new technologies. With the process improvements of the past few years in trench gate technology and light-punch-through vertical structures, it had been thought that the performance of the latest IGBT and pin diode silicon power devices had been brought as close to their theoretical limit as possible. In this paper, fine pattern processing technology is applied along with optimization of the low impurity profile of the buffer layer using thin wafer technology to further reduce the power loss.
Keywords :
insulated gate bipolar transistors; integrated circuit design; p-i-n diodes; IGBT modules; buffer layer; light-punch-through vertical structures; pin diode silicon power devices; power loss; power loss reduction; thin wafer technology; trench gate technology; Bipolar transistors; Buffer layers; Diodes; Energy loss; Insulated gate bipolar transistors; Noise reduction; Semiconductor device noise; Silicon; Surface resistance; Voltage;
Conference_Titel :
Industry Applications Society Annual Meeting, 2008. IAS '08. IEEE
Conference_Location :
Edmonton, Alta.
Print_ISBN :
978-1-4244-2278-4
Electronic_ISBN :
0197-2618
DOI :
10.1109/08IAS.2008.368