Nanomanipulation of 2 inch wafer fabrication of vertically aligned carbon nanotube arrays by nanoimprint lithography

In order to scale up CNT array fabrication to wafer scale, we propose here thermal nanoimprint lithography; the resolution is only limited by the stamp, and thus can approach that of the EBL, and the throughput is many orders of magnitude higher. The automation of nanohandling sequences using VACNTs grown by the NIL method paves the way for fast prototypic assembly of CNT-based devices [7]. For nanomanipulation, the advantages of such an ordered array, with well-defined positions for all the CNTs, is that once calibrated the manipulation system, can locate the CNT automatically. Another advantage is that the CNTs can be grown with high degree of uniformity across a large area. A single CNT can be picked up without possibility of interfering from other CNTs.