• DocumentCode
    3216635
  • Title

    Study of controlled growth of carbon nanotubes in microstructures at low temperature

  • Author

    Yang, Dong ; Jun Chen ; Deng, S.Z. ; Xu, N.S.

  • Author_Institution
    State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
  • fYear
    2010
  • fDate
    14-16 Oct. 2010
  • Firstpage
    518
  • Lastpage
    518
  • Abstract
    In this paper, thermal-catalytic chemical vapor deposition (thermal-CVD) is used to improve the quality of carbon nanotubes (CNTs) by varying the thickness of catalyst (Ni), processing time of the hydrogen treatment, flow rate of reaction gas (C2H2). And also the properties of CNTs on different buffer layers (W,Ti, etc) in microstructures on glass substrates are studied. The grown CNTs are examined by scanning electron microscopy (SEM) and the field emission properties are presented.
  • Keywords
    buffer layers; carbon nanotubes; chemical vapour deposition; crystal microstructure; field emission; nanofabrication; scanning electron microscopy; C-Ti-SiO2; C-W-SiO2; CVD; SEM; SiO2; buffer layers; carbon nanotubes; field emission properties; flow rate; glass substrates; hydrogen treatment; microstructures; scanning electron microscopy; thermal-catalytic chemical vapor deposition;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-6645-0
  • Type

    conf

  • DOI
    10.1109/IVESC.2010.5644222
  • Filename
    5644222
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3216635