A novel approach to corner compensation of multistep Si(100) terraced structure for microlens

Author

Chung, C.K. ; Lee, C.C. ; Wu, C.Y.

Author_Institution

Microsyst. Lab., Ind. Technol. Res. Inst., Hsinchu, Taiwan

fYear

1998

fDate

20-24 July 1998

Abstract

Summary form only given. The multistep microlens with same step height are the important components in the optical microelectromechanical system (MEMS), especially Si(100) microlens for the infrared (IR) imager to condense IR radiation into the detector module and increase its responsibility. We have demonstrated the multistep Si(100) terraced structure for microlens by one photomask and KOH anisotropic etching.

Keywords

electromechanical effects; etching; infrared imaging; integrated optics; masks; microlenses; micromechanical devices; modules; optical fabrication; silicon; IR imager; IR radiation condensing; KOH; KOH anisotropic etching; MEMS; Si; Si(100) microlens; corner compensation; detector module; microlens; multistep Si(100) terraced structure; multistep microlens; optical microelectromechanical system; photomask; responsibility; Anisotropic magnetoresistance; Geometrical optics; Infrared detectors; Infrared imaging; Lenses; Microelectromechanical systems; Micromechanical devices; Microoptics; Optical devices; Radiation detectors;

fLanguage

English

Publisher

ieee

Conference_Titel

Broadband Optical Networks and Technologies: An Emerging Reality/Optical MEMS/Smart Pixels/Organic Optics and Optoelectronics. 1998 IEEE/LEOS Summer Topical Meetings

Conference_Location

Monterey, CA, USA

Print_ISBN

0-7803-4953-9

Type

conf

DOI

10.1109/LEOSST.1998.689741

Filename

689741