Title :
Field electron emission from hydrogen plasma treated nano-ZnO thin films
Author :
Wang Xiao-ping ; Zhang Shi ; Zhu Yu-zhuan ; Wang Li-jun ; Li Huai-hui ; Liu Xin-xin ; Mei Cui-yu
Author_Institution :
Coll. of Sci., Univ. of Shanghai for Sci. & Technol., Shanghai, China
Abstract :
This paper presents field electron emission current density of the hydrogen plasma treated nano-ZnO thin films. The surface morphology, microstructure and surface resistance of nano-ZnO thin films deposited on Mo layer are characterized by X-ray diffraction pattern (XRD), field emission scanning electron microscopy (FE-SEM), energy dispersive spectrum (EDS) and surface resistance meter.
Keywords :
II-VI semiconductors; X-ray chemical analysis; X-ray diffraction; current density; electron beam deposition; electron field emission; field emission electron microscopy; nanostructured materials; plasma CVD; scanning electron microscopy; semiconductor growth; semiconductor thin films; surface morphology; surface resistance; wide band gap semiconductors; zinc compounds; EDS; FESEM; Mo; X-ray diffraction pattern; XRD; ZnO; electron beam vapor deposition; energy dispersive spectrum; field electron emission current density; field emission scanning electron microscopy; hydrogen plasma treated nanostructured thin films; microstructure; microwave plasma chemical vapor deposition; surface morphology; surface resistance;
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
DOI :
10.1109/IVESC.2010.5644328
