DocumentCode
3219337
Title
Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma
Author
Wu, A.T. ; Ike, R. ; Phillips, H.L. ; Valente, A.-M. ; Wang, H. ; Wu, G.
Author_Institution
Thomas Jefferson National Accelerator Facility, Newport News, VA 23606, USA, andywu@jlab.org
fYear
2005
fDate
16-20 May 2005
Firstpage
4153
Lastpage
4155
Abstract
Niobium (Nb) thin film deposited on copper (Cu) cavities through electron cyclotron resonance (ECR) plasma appears to be an attractive alternative technique for fabricating superconducting radio frequency cavities to be used in particle accelerators. The performance of these obtained Nb/Cu cavities is expected to depend on the surface characteristics of the Nb films. In this report, we investigate the influence of deposition energy on surface morphology, microstructure, and chemical composition of Nb films deposited on small Cu disks employing a metallographic optical microscope, a 3-D profilometer, a scanning electron microscope, and a dynamic secondary ion mass spectrometry. The results will be compared with those obtained on Nb surfaces treated by BCP, EP, and BEP.
Keywords
Copper; Niobium; Optical films; Optical microscopy; Plasma accelerators; Scanning electron microscopy; Superconducting films; Superconducting thin films; Surface morphology; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 2005. PAC 2005. Proceedings of the
Print_ISBN
0-7803-8859-3
Type
conf
DOI
10.1109/PAC.2005.1591748
Filename
1591748
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