Title :
Electron emission studies of nano-graphite clusters embedded in amorphous carbon films
Author :
Chua, Daniel H. C. ; Koh, A.T.T.
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Univ. of Singapore, Singapore, Singapore
Abstract :
The electron emission properties from carbon nanocomposite films deposited at elevated temperatures using pulsed laser deposition techniques have been studied. By using both Fowler-Nordhiem and Wentzel-Kramers-Brillouin approximation for electron tunneling, changes of the internal enhancement factors were studied. The internal enhancement ratios were found to have a ratio of β100: β400: β700 = 1 : 1.46 : 2.02 for films deposited at 100°C, 400°C and 700°C respectively, thus showing that the enhancement was doubled when the temperature was increased in the range tested. High resolution XPS and TEM showed that both the formation of embedded nano-graphite clusters and an increase in the sp2 bonded clusters were the main factors that enhanced electron emission. From electric field versus anode-cathode distance curves, we have determined our films to have an emission mechanism akin to carbon nanotubes, confirming the presence of conductive channels within the films.
Keywords :
WKB calculations; X-ray photoelectron spectra; amorphous state; atomic clusters; carbon; electron field emission; graphite; nanocomposites; pulsed laser deposition; transmission electron microscopy; C-C; Fowler-Nordhiem approximation; TEM; Wentzel-Kramers-Brillouin approximation; X-ray photoelectron spectra; amorphous carbon films; anode-cathode distance curves; carbon nanocomposite films; carbon nanotubes; conductive channels; electron emission; electron tunneling; embedded nanographite cluster formation; high resolution XPS; internal enhancement ratios; nanographite clusters; pulsed laser deposition techniques; sp2 bonded clusters; temperature 100 degC; temperature 400 degC; temperature 700 degC; transmission electron microscopy;
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
DOI :
10.1109/IVESC.2010.5644369