DocumentCode
3220115
Title
Surface acoustic wave propagation on piezoelectric substrates with thin-film PECVD silicon nitride
Author
Hickernell, F.S. ; Knuth, H.D. ; Hickernell, T.S. ; Mang, L.
Author_Institution
Gov. & Space Technol. Group, Motorola Inc., Scottsdale, AZ, USA
fYear
1995
fDate
31 May-2 Jun 1995
Firstpage
530
Lastpage
536
Abstract
The SAW characteristics of thin-film silicon nitride (Si3 N4) on piezoelectric substrates of Y-Z and 64° Y-X lithium niobate, and 36° Y-X lithium tantalate have been measured in the frequency range from 30 MHz to above 1.0 GHz. Silicon nitride films 250, 500, and 1000 nm thick were deposited by plasma enhanced chemical vapor deposition (PECVD). The SAW velocity and propagation loss properties were measured using linear arrays of thin-film aluminum interdigital electrodes patterned on the upper film surface. The elastic constants of the films could be determined by fitting a theoretical velocity dispersion curve to the measured velocities for Rayleigh wave propagation. The SAW propagation loss values for the films on the different substrates were compared to the loss characteristics without the film layers. Temperature coefficient of frequency (TCF) measurements of the SAW velocity characteristics for the various film/substrate combinations were also made. The results of these measurements, comparative data on acoustic constants, and the performance enhancements for SAW devices which could be realized by the use of silicon nitride on piezoelectric substrates are discussed
Keywords
Rayleigh waves; acoustic materials; dielectric thin films; piezoelectric materials; plasma CVD coatings; silicon compounds; surface acoustic waves; 30 MHz to 1.0 GHz; LiNbO3; LiTaO3; Rayleigh waves; Si3N4; acoustic constants; elastic constants; linear array; piezoelectric substrates; propagation loss; surface acoustic wave propagation; temperature coefficient of frequency; thin-film PECVD silicon nitride; thin-film aluminum interdigital electrodes; velocity dispersion; Acoustic measurements; Acoustic propagation; Acoustic waves; Piezoelectric films; Plasma measurements; Propagation losses; Silicon; Substrates; Surface acoustic waves; Velocity measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-2500-1
Type
conf
DOI
10.1109/FREQ.1995.484049
Filename
484049
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