Photoelectron emission from mica by light with energy lower than photothreshold

Author

Sakakibara, T. ; Endo, M. ; Hasegawa, T. ; Xu, D.R.

Author_Institution

Dept. of Electr. & Electron. Eng., Chuo Univ., Tokyo, Japan

fYear

1992

fDate

22-25 Jun 1992

Firstpage

52

Lastpage

56

Abstract

In order to determine the mechanism of photoelectron emission from the cleaved mica surface in more detail, the influence of the luminous intensity on the emission and the photothreshold was studied experimentally. The photoelectron emission from the mica surface is found to be considerably influenced by temperature and luminous intensity, and this phenomenon can mostly by attributed to the fact that the photothreshold for emission varies with intensity as well as temperature. The shift of the photothreshold with the temperature is comparatively large (0.63 eV between 20°C and -100°C), and therefore it is suggested that thermal excitation contributes to the process of photoelectron emission. The more intensive illumination causes the photothreshold to shift to the shallower levels in the surface states, with the result that the electrons trapped in the states are accumulatively excited and are finally emitted even under illumination with energy lower than the photothreshold

Keywords

electron traps; mica; photoemission; -100 to 20 C; cleaved surface; luminous intensity; mica; photoelectron emission; photothreshold; temperature effect; thermal excitation; trapped electrons; Cathodes; Current measurement; Dielectrics; Electrodes; Energy measurement; Lamps; Length measurement; Lighting; Photoelectricity; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Conduction and Breakdown in Solid Dielectrics, 1992., Proceedings of the 4th International Conference on

Conference_Location

Sestri Levante

Print_ISBN

0-7803-0129-3

Type

conf

DOI

10.1109/ICSD.1992.224959

Filename

224959