• DocumentCode
    3220659
  • Title

    Y-junction silicon carbide nanowires

  • Author

    Song, Hongbin ; Jiang, Hongbo ; Cao, L.Z. ; Li, Zhi Min ; Li, D.B. ; Miao, G.Q. ; Sun, X.J. ; Chen, Y.Z.

  • Author_Institution
    Key Lab. of Excited State Processes, Chinese Acad. of Sci., Changchun, China
  • fYear
    2010
  • fDate
    14-16 Oct. 2010
  • Firstpage
    77
  • Lastpage
    77
  • Abstract
    Summary form only given. Silicon carbide nanowires with junctions are considered to be of potential value in nanoelectronics. A simple method by catalyst-assisted vapor-liquid-solid reaction for producting Y-junction silicon carbide nanowires is described. The Y-junction silicon carbide nanowires are investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). It is found that all the Y-junctions have a predominant branching angle around 90°C, roughly twice the reported bending angle of single bend junctions. The reasons of formation Y-junction may be caused by gas flow fluctuate as reported in reference. This finding provides a possibility for SiC nanowires application in nanoelectronics.
  • Keywords
    nanofabrication; nanowires; scanning electron microscopy; semiconductor growth; semiconductor quantum wires; silicon compounds; transmission electron microscopy; wide band gap semiconductors; SEM; SiC; TEM; Y-junction silicon carbide nanowires; bending angle; catalyst-assisted vapor-liquid-solid reaction; gas flow fluctuation; nanoelectronics; predominant branching angle; scanning electron microscopy; single bend junctions; transmission electron microscopy; Nanowires; Formation mechanism; Gas flow fluctuate; SiC nanowires; Y-junction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-6645-0
  • Type

    conf

  • DOI
    10.1109/IVESC.2010.5644419
  • Filename
    5644419