• DocumentCode
    3220710
  • Title

    Measurement of electrical conductivity of high-temperature weakly nonideal insulator vapors

  • Author

    Zaghloul, M.R. ; Al-Naiemy, M. ; Bourham, M.A.

  • Author_Institution
    Dept. of Phys., United Arab Emirates Univ., Al-Ain, United Arab Emirates
  • fYear
    2009
  • fDate
    1-5 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Successful measurements of the electrical conductivity of weakly non-ideal partially ionized complex plasma mixtures generated from dielectric materials are presented. The complex multi-component, partially ionized vapors were generated using an electrothermal (ET) plasma source operated in the ablation controlled arc regime where the compound dielectric materials were used as the liner of the capillary wall serving as the source of plasma species. The measured discharge current is used in conjunction with the active or pure resistive part of the recoded discharge voltage to calculate the electrical conductivity as a function of time. A comprehensive one-dimensional time-dependent computer code with radiation transport, which uses the recovered Ohmic input power as the only driving force of the computations, is used to report the corresponding plasma state. Measurements in the temperature range 11,000-16,200 K and density range 0.1-25 kg/m3 were performed and the results are presented, discussed and compared to theoretical predictions.
  • Keywords
    dielectric materials; discharges (electric); electrical conductivity; plasma sources; ablation controlled arc; dielectric materials; electrical conductivity; electrothermal plasma source; insulator vapors; recoded discharge voltage; Conductivity measurement; Dielectric materials; Dielectric measurements; Dielectrics and electrical insulation; Electric variables measurement; Fault location; Plasma materials processing; Plasma measurements; Plasma sources; Plasma transport processes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-2617-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.2009.5227744
  • Filename
    5227744