DocumentCode
3220817
Title
157 nm initiatives/status-International Sematech
Author
Harbison, R.S.
fYear
1999
fDate
6-8 July 1999
Firstpage
52
Abstract
Summary form only given. The 157 nm optical solution for the 100 nm node and below has become a popular choice over the past several months. This rise in interest has been given by several factors: 1. The NGL solutions have been moving to the right and 2. The cost of a 157 nm solution may be less than a 193 nm plus all known RETS. Although the 157 nm optical technology was previously viewed as having too many show stoppers, e.g. material issues (lens and reticles) plus being viewed as a single node option. It has recently emerged as leading contender for the 100 nm node. This talk reviews the feasibility study currently being performed at MIT/LL focusing on the various key issues and data to date.
Keywords
reticles; reviews; ultraviolet lithography; 100 nm; 157 nm; International Sematech; NGL solutions; lens; material issues; optical technology; reticles; review; single node option; Costs; Optical materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location
Yokohama, Japan
Print_ISBN
4-930813-97-2
Type
conf
DOI
10.1109/IMNC.1999.797472
Filename
797472
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