Title :
Challenges for VUV lithography
Author_Institution :
ULSI Process Technol. Dev. Center, Matsushita Electron. Corp., Kyoto, Japan
Abstract :
The paper discusses the challenges of current optical lithography processes such as VUV lithography. Future miniaturization trends in semiconductor production are also discussed.
Keywords :
reviews; ultraviolet lithography; VUV lithography; miniaturization trends; optical lithography processes; semiconductor production; vacuum UV lithography; CMOS technology; Consumer electronics; Electronics industry; Large scale integration; Lithography; Mass production; Optical devices; Optical mixing; Random access memory; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797473
