DocumentCode
3220932
Title
Feasibility of VUV lithography
Author
Shiraishi, N. ; Owa, S.
Author_Institution
IC Equip. Div., Nikon Corp., Tokyo, Japan
fYear
1999
fDate
6-8 July 1999
Firstpage
68
Lastpage
69
Abstract
The feasibility of F/sub 2/ lithography (VUV lithography) was discussed positively from a viewpoint of optical materials and mask materials. The laser durability of CaF/sub 2/ and new materials for the F/sub 2/ mask substrate are discussed.
Keywords
masks; optical materials; ultraviolet lithography; F/sub 2/ lithography; VUV lithography; laser durability; mask substrate material; optical materials; Absorption; Gas lasers; Lenses; Lighting; Lithography; Open wireless architecture; Optical materials; Productivity; Silicon compounds; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location
Yokohama, Japan
Print_ISBN
4-930813-97-2
Type
conf
DOI
10.1109/IMNC.1999.797480
Filename
797480
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