Title :
Feasibility of VUV lithography
Author :
Shiraishi, N. ; Owa, S.
Author_Institution :
IC Equip. Div., Nikon Corp., Tokyo, Japan
Abstract :
The feasibility of F/sub 2/ lithography (VUV lithography) was discussed positively from a viewpoint of optical materials and mask materials. The laser durability of CaF/sub 2/ and new materials for the F/sub 2/ mask substrate are discussed.
Keywords :
masks; optical materials; ultraviolet lithography; F/sub 2/ lithography; VUV lithography; laser durability; mask substrate material; optical materials; Absorption; Gas lasers; Lenses; Lighting; Lithography; Open wireless architecture; Optical materials; Productivity; Silicon compounds; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797480
