• DocumentCode
    3221370
  • Title

    Deposition of Ti/C nano-composite thin films by magnetron DC sputtering using dual targets

  • Author

    Sonoda, Takuji ; Nakao, Satomi ; Ikeyama, M.

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Nagoya, Japan
  • fYear
    2010
  • fDate
    14-16 Oct. 2010
  • Firstpage
    338
  • Lastpage
    338
  • Abstract
    Deposition of Ti/C nanocomposite thin films by magnetron DC sputtering was examined using dual targets of titanium and carbon, in order to investigate the effects of the distribution of titanium atoms and carbon atoms in the films on their surface morphology and their mechanical properties or physical properties. The Ti/C nano-composite thin films were deposited on glass substrates in the atmosphere of argon at the pressure of 0.4Pa by co-sputtering of both a titanium target and a carbon one.
  • Keywords
    carbon; hardness; nanocomposites; nanofabrication; sputter deposition; surface morphology; thin films; titanium; SiO2; Ti-C; argon atmosphere; carbon atoms; dual targets; glass substrates; magnetron DC sputter deposition; mechanical properties; nanocomposite thin films; pressure 0.4 Pa; surface morphology; titanium atoms; Atomic layer deposition; Films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-6645-0
  • Type

    conf

  • DOI
    10.1109/IVESC.2010.5644453
  • Filename
    5644453