DocumentCode
3221370
Title
Deposition of Ti/C nano-composite thin films by magnetron DC sputtering using dual targets
Author
Sonoda, Takuji ; Nakao, Satomi ; Ikeyama, M.
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Nagoya, Japan
fYear
2010
fDate
14-16 Oct. 2010
Firstpage
338
Lastpage
338
Abstract
Deposition of Ti/C nanocomposite thin films by magnetron DC sputtering was examined using dual targets of titanium and carbon, in order to investigate the effects of the distribution of titanium atoms and carbon atoms in the films on their surface morphology and their mechanical properties or physical properties. The Ti/C nano-composite thin films were deposited on glass substrates in the atmosphere of argon at the pressure of 0.4Pa by co-sputtering of both a titanium target and a carbon one.
Keywords
carbon; hardness; nanocomposites; nanofabrication; sputter deposition; surface morphology; thin films; titanium; SiO2; Ti-C; argon atmosphere; carbon atoms; dual targets; glass substrates; magnetron DC sputter deposition; mechanical properties; nanocomposite thin films; pressure 0.4 Pa; surface morphology; titanium atoms; Atomic layer deposition; Films;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location
Nanjing
Print_ISBN
978-1-4244-6645-0
Type
conf
DOI
10.1109/IVESC.2010.5644453
Filename
5644453
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