New writing routines for SEM based e-beam lithography

Author

Dubonos, S.V. ; Raith, H.F. ; Svintsov, A.A. ; Zaitsev, S.I.

Author_Institution

Inst. of Microelectron. Technol. & High Purity Mater., Acad. of Sci., Chernogolovka, Russia

fYear

1999

fDate

6-8 July 1999

Firstpage

110

Lastpage

111

Abstract

The challenge of SEM based e-beam lithography is not just in copying writing routines used in dedicated e-beam lithography machines, but also in exploring new fields of application. A new writing routine for TIFF images with their 256 grey levels allows to produce 3-dimensional structures in resist, which can be used e.g. for the direct writing of computer-generated phase holograms. Another new writing routine allows a full compensation of limiting SEM performance in respect to its dynamic behaviour and field distortion. By using this method, the main restrictions of SEM based e-beam lithography can be overcome.

Keywords

computer-generated holography; electron beam lithography; scanning electron microscopy; SEM; TIFF image; computer-generated phase hologram; dynamic compensation; e-beam lithography; field distortion; resist; three-dimensional structure; writing routine; Application software; Electrostatic measurements; Error correction; Lead; Lithography; Microelectronics; Pixel; Resists; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International

Conference_Location

Yokohama, Japan

Print_ISBN

4-930813-97-2

Type

conf

DOI

10.1109/IMNC.1999.797501

Filename

797501