Development of Functional Ceramic Films for Nano and Microsystems Technology

Author

Schonecker ; Gebhardt, S. ; Schlenkrich, F. ; Endler, I. ; Mayer-Uhma, T. ; Uhlig, S.

Author_Institution

Fraunhofer IKTS, Dresden

Volume

2

fYear

2006

fDate

5-7 Sept. 2006

Firstpage

702

Lastpage

707

Abstract

Ceramic films are considered as key functional material in nano and microsystems technology. IKTS has built the experimental basis for the development of functional films using screen printing, CSD, CVD, PVD, RIE and CMP, covering a wide range of chemical composition, film thickness and processing windows. Substrates of interest are those, forming the integration basis of microsystems, like Silicon (Si) wafers and glass ceramics (LTCC). The present paper is going to discuss the availability of various ceramics films for the design, development and fabrication of advanced nano and microsystems

Keywords

elemental semiconductors; glass ceramics; micromechanical devices; silicon; IKTS; LTCC; Si; chemical composition; film thickness; functional ceramic films; glass ceramics; microsystems technology; nanosystems technology; screen printing; semiconductor wafers; Atherosclerosis; Ceramics; Chemical processes; Chemical technology; Chemical vapor deposition; Glass; Printing; Silicon; Substrates; Windows;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Systemintegration Technology Conference, 2006. 1st

Conference_Location

Dresden

Print_ISBN

1-4244-0552-1

Electronic_ISBN

1-4244-0553-x

Type

conf

DOI

10.1109/ESTC.2006.280088

Filename

4060813