Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF

Author

Kumagai, S. ; Sasaki, M. ; Koyanagi, M. ; Hane, K.

Author_Institution

Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan

fYear

1999

fDate

6-8 July 1999

Firstpage

150

Lastpage

151

Abstract

Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +*/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.

Keywords

chlorine; fluorescence; metastable states; plasma chemistry; plasma diagnostics; pulse time modulation; sputter etching; time resolved spectroscopy; Cl; charging damage; etch anisotropy; etch rate; etch selectivity; metastable Cl/sup +*/ ions; plasma diagnostics; pulse time-modulated inductively coupled plasma etching; reactive plasma species composition; time resolved laser induced fluorescence spectroscopy; Delay effects; Density measurement; Etching; Frequency modulation; Laser transitions; Metastasis; Plasma applications; Plasma measurements; Plasma temperature; Time measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International

Conference_Location

Yokohama, Japan

Print_ISBN

4-930813-97-2

Type

conf

DOI

10.1109/IMNC.1999.797521

Filename

797521