Title :
A dynamic simulation of electron beam induced charging-up of insulators
Author :
Kotera, M. ; Yamaguchi, K. ; Suga, H.
Author_Institution :
Fac. of Eng., Osaka Inst. of Technol., Japan
Abstract :
It is known that insulating materials charge-up negatively or positively depending on its condition during the electron beam (EB) irradiation. This charging disturbs various applications of EB technologies. In the present study a simulation model is proposed to express the charging mechanism of insulators as a function of time under EB irradiation The material studied here is PMMA which is a typical EB resist. In the simulation, the electron deposition distribution is calculated by a Monte Carlo simulation of electron trajectories in the specimen, where the production of secondary electrons and Auger electrons is taken into account. The electron yield obtained by the simulation for non-charged specimen agrees quite well with the experimental result, which has been obtained by using a pulse beam technique.
Keywords :
Auger effect; Monte Carlo methods; electron beam effects; electron resists; polymers; secondary electron emission; semiconductor process modelling; surface charging; Auger electrons; EB resist; Monte Carlo simulation; PMMA; dynamic simulation; electron beam induced charging-up; electron deposition distribution; electron trajectories; electron yield; insulating materials; insulators; secondary electrons; simulation model; Conductivity; Electric potential; Electron beams; Information science; Insulation; Materials science and technology; Poisson equations; Production; Resists; Yield estimation;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797529