MOSFETs reliability: electron trapping in gate dielectric

In this paper, a charge pumping technique has been used to measure hot-carrier degradation of n-MOSFETs. The charge pumping technique is a well established technique for the characterization of interface traps in MOS transistors. This technique is capable of independently providing the amount of interface traps generated during the injection and the sign and the amount of charges that have been trapped in the gate dielectrics. The analysis of the selection of charge pumping parameters has been done experimentally in order to select the appropriate value of charge pumping parameters before carrying out any experiment in this paper. This paper presents a study of oxide damage due to the hot carrier degradation that has been carried out experimentally on five samples of n-MOSFETs with different types of dielectrics. The damage has been characterized in terms of oxide trapping and interface state density. A comparison of electron trapping in each type of dielectric is included in the discussion. Four types of oxynitrides with different growth conditions have been used. The interface trap generation is found to be suppressed by nitridation