DocumentCode

3222405

Title

New Approaches To Excimer Laser Resists

Author

Rothschild, M.

Author_Institution

MIT

fYear

1988

fDate

2-4 Nov. 1988

Firstpage

207

Lastpage

209

Keywords

Dry etching; Fluctuations; Image resolution; Lithography; Optical design; Optical materials; Optical pulses; Resists; Surface resistance; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1988. Conference Proceedings. LEOS '88.

Conference_Location

Santa Clara, CA, USA

Type

conf

DOI

10.1109/LEOS.1988.689806

Filename

689806