Title :
Statistical parameter control for optimum design and manufacturability of VLSI circuits
Author :
Bolt, M.J.B. ; Engel, J. ; Klauw, C. L M v d ; Rocchi, M.
Author_Institution :
Philips Components, Eindhoven, Netherlands
Abstract :
A first-order statistical worst-case design methodology for VLSI products that is based on uncorrelated groups of geometry- and temperature-independent design parameters has been developed. The parameters are statistically monitored in production by extending in-line SPC (statistical process control) to PCM results. Key groups of design parameters are identified by means of a complete sensitivity analysis (including second-order terms and cross terms if necessary) on the performance parameters within the parameter windows. An estimate of the 3-σ performance limits is then readily derived from the results of the sensitivity analysis. The uncorrelated groups of geometry- and temperature-independent design parameters have been found to be an optimum interface between process and design, making statistical design possible in a very cost-effective way. Experimental qualification of the method is discussed based on development and production data of a high-speed 1.2-μm 64 K CMOS SRAM
Keywords :
VLSI; integrated circuit manufacture; integrated circuit technology; statistical process control; 1.2 micron; 64 K CMOS SRAM; 64 kbit; PCM results; SPC; VLSI circuits; VLSI products; cross terms; geometry independent design parameters; groups of design parameters; optimum design; optimum manufacturability; parameter windows; performance limits; performance parameters; production data; second-order terms; sensitivity analysis; statistical parameter control; statistical process control; statistical worst-case design methodology; temperature-independent design parameters; uncorrelated groups of design parameters; Condition monitoring; Design methodology; Phase change materials; Process control; Process design; Production; Qualifications; Random access memory; Sensitivity analysis; Very large scale integration;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1990. ISMSS 1990., IEEE/SEMI International
Conference_Location :
Burlingame, CA
DOI :
10.1109/ISMSS.1990.66118