• DocumentCode
    3223458
  • Title

    Polarization-inverted multilayered pure shear mode AlN film resonator

  • Author

    Suzuki, Masashi ; Yanagitani, Takahiko

  • Author_Institution
    Grad. Sch. of Eng., Nagoya Inst. of Technol., Nagoya, Japan
  • fYear
    2011
  • fDate
    18-21 Oct. 2011
  • Firstpage
    312
  • Lastpage
    315
  • Abstract
    c-axis parallel AlN film is suitable for pure shear mode devices. Polarization-inverted multilayered structure can excite high order mode resonance. The film thickness of high order mode resonator is thicker than that of fundamental mode resonator in same operating frequency. Therefore, the multilayered resonator is expected to have high power handling capability. c-axis parallel polarization-inverted multilayered AlN films were fabricated by ion beam assisted deposition (IBAD). caxis parallel orientation was formed under the 3 kV accelerated ion beam irradiation. Shear mode resonator was prepared to investigate piezoelectric properties of the film. Only pure shear wave without any longitudinal wave was excited in the resonators. k15 was determined to be 0.05 and this value is 71 % of the single crystalline AlN. We considered that in-plane crystal growth direction should to be determined by the ion beam irradiation direction. c-axis parallel multilayer AlN film was fabricated by inverting in-plane beam irradiation direction. High order mode resonance was observed in the resonators, showing that polarization was inverted in the multilayer AlN films.
  • Keywords
    III-V semiconductors; aluminium compounds; crystal resonators; ion beam assisted deposition; ion beam effects; multilayers; piezoelectric thin films; piezoelectricity; semiconductor thin films; thin film devices; wide band gap semiconductors; AlN; IBAD; aluminum nitride film thickness; high-order mode resonance; high-power handling capability; ion beam assisted deposition; ion beam irradiation; multilayered resonator; piezoelectric properties; polarization inverted multilayered pure shear mode; shear mode resonator; voltage 3 kV; Acoustics; Crystals; Films; Ion beams; Radiation effects; Resonant frequency; Substrates; AlN; Polarizationinverted multi-layer films; c-axis parallel films; pure shear mode;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2011 IEEE International
  • Conference_Location
    Orlando, FL
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4577-1253-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2011.0075
  • Filename
    6293063