• DocumentCode
    3223681
  • Title

    Facility fluids cost models

  • Author

    Patel, Nipa ; Boswell, Tracy ; Nelson, Tom

  • Author_Institution
    Adv. Micro Devices Inc., Austin, TX, USA
  • fYear
    1995
  • fDate
    13-15 Nov 1995
  • Firstpage
    35
  • Lastpage
    41
  • Abstract
    As a part of a SEMATECH project to improve the cost performance of semiconductor facility fluid systems, cost models have been developed in Microsoft Excel for gas chemicals, and ultra pure water (UPW) systems. These cost models are designed to permit cost analysis associated with the acquisition, use, and maintenance of fluid systems as well as cost comparisons of various fluid supply and distribution methods using a consistent costing methodology. The system attributes to be input in the model include the flowrate, and maintenance/reliability data. The subsystem attributes to be input in the model include the capital costs, leased equipment costs, utility usage, labor requirements, and other operating costs. Based on these inputs, the total capital and operating costs are calculated for a fluid system and ten year cost analysis is performed. The output is reported in terms of cost per unit volume.
  • Keywords
    costing; economics; integrated circuit manufacture; planning; semiconductor process modelling; SEMATECH project; capital costs; cost analysis; cost performance; flowrate; fluid distribution methods; fluid supply; gas chemicals; labor requirements; leased equipment costs; maintenance/reliability data; semiconductor facility fluid systems; subsystem attributes; ultra pure water; utility usage; Calculators; Chemicals; Costing; Costs; Gases; Maintenance; Measurement techniques; Performance analysis; Semiconductor device modeling; Spreadsheet programs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-2713-6
  • Type

    conf

  • DOI
    10.1109/ASMC.1995.484336
  • Filename
    484336