DocumentCode
3223760
Title
Microstructure-induced phonon focusing effects and opportunities for improved material quantification
Author
Blackshire, James L.
Author_Institution
RXLP, Air Force Res. Lab., Wright-Patterson AFB, OH, USA
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
782
Lastpage
785
Abstract
It is well known that single-crystal materials such as silicon have anisotropic elastic properties which depend on crystalline direction, causing the characteristic properties of a propagating elastic wave to have spatial and directional dependencies. As a result, variations in the speed and energy flux of an elastic waves propagating in a single crystal material typically produce spatial patterns, which can be used to infer the internal structure of a crystalline material. For polycrystalline materials, similar effects can be manifested when textured or single phase, equiaxed grains are involved, and coherent wave interference processes exist. Three examples of this are presented in this paper, where the propagation of longitudinal waves within single crystal silicon, textured titanium, and polycrystalline nickel materials are characterized using scanning laser vibrometry in a thru-transmission detection mode. By measuring and studying the resulting patterns, it is anticipated that inversion methods can be developed for the quantitative evaluation of single crystal and polycrystalline materials.
Keywords
crystal microstructure; elastic waves; elasticity; elemental semiconductors; focusing; nickel; phonons; silicon; titanium; wave propagation; Ni; Si; Ti; anisotropic elastic properties; coherent wave interference process; crystalline direction; crystalline material internal structure; elastic wave propagation; energy flux; equiaxed grains; longitudinal waves propagation; material quantification; microstructure-induced phonon focusing effects; polycrystalline materials; scanning laser vibrometry; single crystal silicon; single-crystal materials; textured titanium; thru-transmission detection mode; Acoustics; Crystals; Focusing; Phonons; Silicon; Ultrasonic variables measurement; Microstructure; Phonon Focusing; Scanning Laser Vibrometry; Ultrasound Scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2011 IEEE International
Conference_Location
Orlando, FL
ISSN
1948-5719
Print_ISBN
978-1-4577-1253-1
Type
conf
DOI
10.1109/ULTSYM.2011.0191
Filename
6293082
Link To Document