DocumentCode :
3224530
Title :
Managing multi-chamber tool productivity
Author :
Auches, Bruce ; Grewal, Gulsher ; Silverman, Peter
Author_Institution :
Intel Corp., Santa Clara, CA, USA
fYear :
1995
fDate :
13-15 Nov 1995
Firstpage :
240
Lastpage :
247
Abstract :
Multi-chamber tools have enabled significant technical breakthroughs in wafer processing in the last decade. Expenditures for these tools are increasing as a percentage of the total capital base. Fully one-third of the capital dollars invested in 0.4 μm technology processing equipment will be spent on multi-chamber tools. These tools also present some special productivity problems, as a significant portion of the tool can fail to produce wafers while the remaining portions of the tool still are able to do so at a reduced run rate. Classical measures of tool availability and run rates are insufficient to account for reduced output when part of the tool is down. This paper presents measurements, operating scenarios and operating guidelines to maximize multi-chamber tool productivity in a volume manufacturing environment.
Keywords :
cluster tools; human resource management; integrated circuit manufacture; semiconductor device manufacture; sensitivity analysis; 0.4 micron; multi-chamber tools; operating guidelines; run rates; tool availability; tool productivity; volume manufacturing environment; wafer processing; Availability; Guidelines; Parallel processing; Pollution measurement; Productivity; Pulp manufacturing; Semiconductor device manufacture; Throughput; Vacuum systems; Volume measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
ISSN :
1078-8743
Print_ISBN :
0-7803-2713-6
Type :
conf
DOI :
10.1109/ASMC.1995.484379
Filename :
484379
Link To Document :
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