Title :
Non-destructive detection of ion implant contamination: a SEMATECH/AMD study
Author :
Wenner, Valerie ; Lowell, John ; Shi, Jilnghong ; Larson, Larry
Author_Institution :
Adv. Micro Devices Inc., Austin, TX, USA
Abstract :
In this paper we report on a systematic study of ion implantation equipment currently in operation or development by IC manufacturers and equipment vendors. The application of optical surface photovoltage (SPV) to both quantify and qualify bulk implant-induced contaminants in CZ P-type silicon is emphasized. We address the issue of contaminants and exemplify the use of SPV as a passive, in-line technique for assessment of the problem.
Keywords :
elemental semiconductors; integrated circuit manufacture; ion implantation; nondestructive testing; production testing; silicon; IC manufacturers; SEMATECH/AMD study; Si; bulk implant-induced contaminants; in-line technique; ion implant contamination; ion implantation equipment; nondestructive detection; optical surface photovoltage; Annealing; Implants; Ion implantation; Iron; Optical sensors; Particle beam optics; Pulp manufacturing; Semiconductor device manufacture; Silicon; Surface contamination;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
Print_ISBN :
0-7803-2713-6
DOI :
10.1109/ASMC.1995.484394
