High aspect ratio metallic nanowire arrays by pulsed electrodeposition

This work describes the electrochemical fabrication of high aspect ratio Ag nanowire (NW) arrays with the aim of their later application in an anisotropic conductive adhesive NW film (ACANWF). The basis for the production is the well-established electrodeposition process of Ag into pores of anodic oxidized alumina (AAO). Here, deposition was carried out in both, standard DC mode and by pulsed electrodeposition. After variation of the parameters pulse frequency, pulse and pause potential and electrolyte concentration, aspect ratios of 371 (NW length = 26 μm, NW diameter = 70 nm) could be reached within 30 min deposition time where standard DC plating shows much slower NW growth to an aspect ratio of 56. The need for higher aspect ratio NWs is discussed with respect to the construction and manageability of the ACANWF in scaled-up processes.