• DocumentCode
    3224996
  • Title

    Fast speed lateral IGBT with Buried N-region Controlled Anode on SOI substrate

  • Author

    Chen, Wensuo ; Xie, Gang ; Zhang, Bo ; Li, Zhaoji ; Zhao, Mei

  • Author_Institution
    State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • fYear
    2009
  • fDate
    25-27 Dec. 2009
  • Firstpage
    372
  • Lastpage
    375
  • Abstract
    A new lateral insulated-gate bipolar transistor (LIGBT) structure on SOI substrate, called buried N-region controlled anode LIGBT (BNCA-LIGBT), is proposed and discussed. The BNCA-LIGBT is a modified structure of the N-region controlled anode LIGBT (NCA-LIGBT) which we have presented earlier. Numerical simulation results of the BNCA-LIGBT operation show that the turn-off speed is faster and on-state voltage drop is lower than that of the NCA-LIGBT. Furthermore, the BNCA-LIGBT also has the advantages of NCA-LIGBT such as efficient area using, easy driving, effectively NDR suppression in forward I-V characteristics and high breakdown voltage. The proposed SOIBNCA-LIGBT can be fabricated by the conventional SOI power IC´s process steps.
  • Keywords
    insulated gate bipolar transistors; silicon-on-insulator; I-V characteristic; SOI substrate; buried N-region controlled anode; high breakdown voltage; insulated-gate bipolar transistor; lateral IGBT; Anodes; Cathodes; Circuits; Conductivity; Electric breakdown; Insulated gate bipolar transistors; Insulation; Numerical simulation; Phosphors; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits, 2009. EDSSC 2009. IEEE International Conference of
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4244-4297-3
  • Electronic_ISBN
    978-1-4244-4298-0
  • Type

    conf

  • DOI
    10.1109/EDSSC.2009.5394238
  • Filename
    5394238