• DocumentCode
    3225006
  • Title

    ESD protection consideration in nanoscale CMOS technology

  • Author

    Ker, Ming-Dou ; Lin, Chun-Yu

  • Author_Institution
    Inst. of Electron., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
  • fYear
    2011
  • fDate
    15-18 Aug. 2011
  • Firstpage
    720
  • Lastpage
    723
  • Abstract
    The thinner gate oxide in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of IC products. As the feature sizes in nanoscale CMOS technologies are further scaling down, the on-chip ESD protection designs are more challenging. The ESD protection considerations, including ESD design window, area efficiency, leakage current, and high-voltage tolerance, were presented in this abstract. Some possible solutions against these issues in nanoscale CMOS technologies were also included in this paper.
  • Keywords
    CMOS integrated circuits; electrostatic discharge; leakage currents; ESD design window; IC product; area efficiency; electrostatic discharge; high-voltage tolerance; leakage current; nanoscale CMOS technology; on-chip ESD protection design; thinner gate oxide; CMOS integrated circuits; CMOS technology; Clamps; Electrostatic discharges; Leakage current; Logic gates; Nanoscale devices; CMOS; electrostatic discharge (ESD); on-chip ESD protection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
  • Conference_Location
    Portland, OR
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4577-1514-3
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2011.6144345
  • Filename
    6144345