DocumentCode
3225006
Title
ESD protection consideration in nanoscale CMOS technology
Author
Ker, Ming-Dou ; Lin, Chun-Yu
Author_Institution
Inst. of Electron., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear
2011
fDate
15-18 Aug. 2011
Firstpage
720
Lastpage
723
Abstract
The thinner gate oxide in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of IC products. As the feature sizes in nanoscale CMOS technologies are further scaling down, the on-chip ESD protection designs are more challenging. The ESD protection considerations, including ESD design window, area efficiency, leakage current, and high-voltage tolerance, were presented in this abstract. Some possible solutions against these issues in nanoscale CMOS technologies were also included in this paper.
Keywords
CMOS integrated circuits; electrostatic discharge; leakage currents; ESD design window; IC product; area efficiency; electrostatic discharge; high-voltage tolerance; leakage current; nanoscale CMOS technology; on-chip ESD protection design; thinner gate oxide; CMOS integrated circuits; CMOS technology; Clamps; Electrostatic discharges; Leakage current; Logic gates; Nanoscale devices; CMOS; electrostatic discharge (ESD); on-chip ESD protection;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location
Portland, OR
ISSN
1944-9399
Print_ISBN
978-1-4577-1514-3
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2011.6144345
Filename
6144345
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