• DocumentCode
    3226020
  • Title

    Low-stress transfer of graphene and its tuneable resistance by remote plasma treatments in hydrogen

  • Author

    Chen, Waileong ; Tu, Chia-hao ; Liang, Keng-chih ; Liu, Chih-Yi ; Liu, Chuan-Pu ; Tzeng, Yonhua

  • Author_Institution
    Inst. of Microelectron., Nat. Cheng Kung Univ., Tainan, Taiwan
  • fYear
    2011
  • fDate
    15-18 Aug. 2011
  • Firstpage
    1093
  • Lastpage
    1096
  • Abstract
    A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is demonstrated. Electrical and optical characteristics of as-transferred graphene and the hydrogen remote-plasma modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, large-area single-layer graphene is practically very fragile especially during handling and transfer from one substrate to another. Handling of large-area free-standing graphene is even more challenging. Combination of effective transfer and surface treatment of graphene by hydrogenation allows fine tuning of its electrical resistivity for practical applications.
  • Keywords
    electric resistance; electrical resistivity; graphene; hydrogenation; plasma materials processing; surface treatment; C; atomically thin structure; copper foils; electrical characteristics; electrical resistivity; fine tuning; hydrogen remote-plasma modified graphene; hydrogenation; large-area free-standing graphene handling; large-area single-layer graphene; low-stress process; low-stress transfer; optical characteristics; practical applications; remote plasma treatments; surface treatment; thermal CVD single-layer graphene; tuneable resistance; Carbon; Coatings; Copper; Optical films; Plasmas; Resistance; Substrates; graphane; graphene; hydrogen; resistance; transfer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
  • Conference_Location
    Portland, OR
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4577-1514-3
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2011.6144398
  • Filename
    6144398