Title :
Graphene synthesis by thermal-CVD method
Author :
Chung, Wenchiang R. ; Zhao, Yunfan ; Oye, Michael ; Nguyen, Cattien
Author_Institution :
Dept. of Chem. & Mater. Eng., San Jose State Univ., San Jose, CA, USA
Abstract :
Developing a sustainable synthesis method to produce large-area, high-quality, uniform graphene films with controllable thickness is a challenge to many scientists and researchers around the world. Several reported graphene synthesis methods including exfoliation and cleavage, thermal chemical vapor deposition, thermal decomposition of SiC, un-zipping carbon nanotubes, epitaxial growth, and chemical methods have shown some success in producing graphene thin films. This paper uses a thermal-CVD method to successfully grow graphene films on nickel layer with methane as carbon source. The grain orientation and the heat treating process of nickel layer play an important role on the quality of the graphene films. The morphology of graphene films are characterized using AFM, SEM, XRD, and Raman spectroscopy.
Keywords :
Raman spectra; X-ray diffraction; atomic force microscopy; chemical vapour deposition; graphene; heat treatment; pyrolysis; scanning electron microscopy; thin films; AFM; C; Ni; Raman spectroscopy; SEM; XRD; epitaxial growth; grain orientation; graphene films; heat treating process; thermal chemical vapor deposition; thermal decomposition; thermal-CVD method; Annealing; Films; Nickel; Silicon; Substrates; Surface morphology;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location :
Portland, OR
Print_ISBN :
978-1-4577-1514-3
Electronic_ISBN :
1944-9399
DOI :
10.1109/NANO.2011.6144423