• DocumentCode
    3226579
  • Title

    Graphene synthesis by thermal-CVD method

  • Author

    Chung, Wenchiang R. ; Zhao, Yunfan ; Oye, Michael ; Nguyen, Cattien

  • Author_Institution
    Dept. of Chem. & Mater. Eng., San Jose State Univ., San Jose, CA, USA
  • fYear
    2011
  • fDate
    15-18 Aug. 2011
  • Firstpage
    1378
  • Lastpage
    1383
  • Abstract
    Developing a sustainable synthesis method to produce large-area, high-quality, uniform graphene films with controllable thickness is a challenge to many scientists and researchers around the world. Several reported graphene synthesis methods including exfoliation and cleavage, thermal chemical vapor deposition, thermal decomposition of SiC, un-zipping carbon nanotubes, epitaxial growth, and chemical methods have shown some success in producing graphene thin films. This paper uses a thermal-CVD method to successfully grow graphene films on nickel layer with methane as carbon source. The grain orientation and the heat treating process of nickel layer play an important role on the quality of the graphene films. The morphology of graphene films are characterized using AFM, SEM, XRD, and Raman spectroscopy.
  • Keywords
    Raman spectra; X-ray diffraction; atomic force microscopy; chemical vapour deposition; graphene; heat treatment; pyrolysis; scanning electron microscopy; thin films; AFM; C; Ni; Raman spectroscopy; SEM; XRD; epitaxial growth; grain orientation; graphene films; heat treating process; thermal chemical vapor deposition; thermal decomposition; thermal-CVD method; Annealing; Films; Nickel; Silicon; Substrates; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
  • Conference_Location
    Portland, OR
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4577-1514-3
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2011.6144423
  • Filename
    6144423