DocumentCode
3226579
Title
Graphene synthesis by thermal-CVD method
Author
Chung, Wenchiang R. ; Zhao, Yunfan ; Oye, Michael ; Nguyen, Cattien
Author_Institution
Dept. of Chem. & Mater. Eng., San Jose State Univ., San Jose, CA, USA
fYear
2011
fDate
15-18 Aug. 2011
Firstpage
1378
Lastpage
1383
Abstract
Developing a sustainable synthesis method to produce large-area, high-quality, uniform graphene films with controllable thickness is a challenge to many scientists and researchers around the world. Several reported graphene synthesis methods including exfoliation and cleavage, thermal chemical vapor deposition, thermal decomposition of SiC, un-zipping carbon nanotubes, epitaxial growth, and chemical methods have shown some success in producing graphene thin films. This paper uses a thermal-CVD method to successfully grow graphene films on nickel layer with methane as carbon source. The grain orientation and the heat treating process of nickel layer play an important role on the quality of the graphene films. The morphology of graphene films are characterized using AFM, SEM, XRD, and Raman spectroscopy.
Keywords
Raman spectra; X-ray diffraction; atomic force microscopy; chemical vapour deposition; graphene; heat treatment; pyrolysis; scanning electron microscopy; thin films; AFM; C; Ni; Raman spectroscopy; SEM; XRD; epitaxial growth; grain orientation; graphene films; heat treating process; thermal chemical vapor deposition; thermal decomposition; thermal-CVD method; Annealing; Films; Nickel; Silicon; Substrates; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location
Portland, OR
ISSN
1944-9399
Print_ISBN
978-1-4577-1514-3
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2011.6144423
Filename
6144423
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