DocumentCode
3227628
Title
Electron transport properties of individual gallium nitride nanowire decorated with gold nanoparticles
Author
Sundararajan, Jency P. ; McIlroy, David N.
Author_Institution
Dept. of Phys., Univ. of Idaho, Moscow, ID, USA
fYear
2011
fDate
15-18 Aug. 2011
Firstpage
1331
Lastpage
1334
Abstract
Variations in the electron transport properties of individual n-type gallium nitride (n-GaN) nannowires decorated with gold (Au) nanoparticles as a function of nanowire diameter (~50nm - 400nm) have been studied. GaN nanowires were grown by vapor-liquid-solid (VLS) process and single nanowire devices were fabricated by photolithography techniques. Gold nanoparticle (~5nm-10nm) decoration was achieved by plasma enhanced chemical vapor deposition (PECVD). Two orders of magnitude drop of the current in gold decorated GaN nanowires compared to the bare GaN nanowires were observed. This effect is attributed to carrier depletion formed at the n-GaN nanowire/Au nanoparticle interface due to the formation of a metal-semiconductor Schottky junction. Variation in electrical conductivity of the nanowires with and without nanoparticles was highly dependent upon nanowire diameter for a constant nanowire length of 5μm. Bare GaN nanowire shows an exponential decrease in resistance (~ 450 KΩ to 1 KΩ) with increase in nanowire diameter (~ 50nm - 400nm). In case of Au-GaN nanowire, current-voltage measurements exhibited clear rectifying behavior, with the forward bias threshold voltage decreasing linearly with increasing nanowire diameter.
Keywords
III-V semiconductors; Schottky barriers; electrical conductivity; electrical resistivity; gallium compounds; gold; nanoparticles; nanowires; photolithography; plasma CVD; rectification; semiconductor-metal boundaries; wide band gap semiconductors; GaN-Au; PECVD; carrier depletion; current-voltage measurements; electrical conductivity; electrical resistance; electron transport properties; forward bias threshold voltage; gold nanoparticle decoration; metal-semiconductor Schottky junction; n-type gallium nitride nanowires; nanowire diameter; photolithography; plasma enhanced chemical vapor deposition; rectification; size 50 nm to 400 nm; vapor-liquid-solid process; Conductivity; Current-voltage characteristics; Gallium nitride; Gold; Nanoparticles; Nanoscale devices; Resistance; Au nanoparticles; GaN nanowire; Schottky barrier; nanowire conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location
Portland, OR
ISSN
1944-9399
Print_ISBN
978-1-4577-1514-3
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2011.6144471
Filename
6144471
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