• DocumentCode
    3227968
  • Title

    Reduction of hydrogen induced losses in PECVD-SiOxNy optical waveguides in the near infrared

  • Author

    Albers, H. ; Hilderink, L. T H ; Szilágyi, E. ; Paszti, F. ; Lambeck, P.V. ; Popma, Th J A

  • Author_Institution
    MESA Res. Inst., Twente Univ., Enschede, Netherlands
  • Volume
    2
  • fYear
    1995
  • fDate
    30 Oct-2 Nov 1995
  • Firstpage
    88
  • Abstract
    The hydrogen in PECVD-SiOxNy was studied with IR spectroscopy and ERD analysis as a function of the O/N ratio and the annealing treatment up to 1150°C. The results were compared with measured spectral waveguide losses
  • Keywords
    annealing; infrared spectra; optical fabrication; optical loss measurement; optical losses; optical planar waveguides; optical variables measurement; plasma CVD; silicon compounds; 1150 C; H induced losses; O/N ratio; SiOxNy; SiON; annealing treatment; optical waveguides; plasma enhanced CVD; spectral waveguide losses; Annealing; Frequency; Hydrogen; Optical films; Optical losses; Optical refraction; Optical variables control; Optical waveguides; Plasma waves; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-2450-1
  • Type

    conf

  • DOI
    10.1109/LEOS.1995.484610
  • Filename
    484610
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3227968