• DocumentCode
    3228005
  • Title

    Controlled growth of InP/GaInAs(P) based structures by MOCVD

  • Author

    Thrush, E.J.

  • Author_Institution
    Thomas Swan & Co. Ltd., Cambridge, UK
  • Volume
    2
  • fYear
    1995
  • fDate
    30 Oct-2 Nov 1995
  • Firstpage
    92
  • Abstract
    High quality InP/GaInAs(P) structures require precise control of bulk alloy composition and near ideal heterojunction interfaces. The paper reviews some practical solutions to growth problems which had to be overcome to meet these criteria
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; semiconductor epitaxial layers; semiconductor heterojunctions; semiconductor quantum wells; vapour phase epitaxial growth; InP-GaInAs; InP-GaInAsP; InP/GaInAs; InP/GaInAsP; MOCVD; bulk alloy composition; growth problems; near ideal heterojunction interfaces; reviews; Heterojunctions; Indium phosphide; Inductors; Instruments; Lattices; MOCVD; Monitoring; Reproducibility of results; Solids; Uniaxial strain;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-2450-1
  • Type

    conf

  • DOI
    10.1109/LEOS.1995.484612
  • Filename
    484612