DocumentCode
3229385
Title
Synergistic physical synthesis for manufacturability and variability in 45nm designs and beyond
Author
Pan, David Z. ; Cho, Minsik
Author_Institution
Univ. of Texas at Austin, Austin
fYear
2008
fDate
21-24 March 2008
Firstpage
220
Lastpage
225
Abstract
Nanometer IC designs are increasingly challenged by manufacturing closure, i.e., being fabricated with high product yield, mainly due to aggressive technology scaling and increasing process/environmental variations. Realizing the criticality of addressing manufacturability for higher yield and tolerance to variations during design, there has been a surge of research activities recently from both academia and industry. In this paper, we will survey the key activities in synergistic physical synthesis and shed lights on some of the future research directions.
Keywords
integrated circuit design; integrated circuit manufacture; IC manufacturing; nanometer IC designs; size 45 nm; synergistic physical synthesis; Design for manufacture; Lithography; Manufacturing industries; Manufacturing processes; Optical interconnections; Optical noise; Process design; Semiconductor device manufacture; Surges; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2008. ASPDAC 2008. Asia and South Pacific
Conference_Location
Seoul
Print_ISBN
978-1-4244-1921-0
Electronic_ISBN
978-1-4244-1922-7
Type
conf
DOI
10.1109/ASPDAC.2008.4483945
Filename
4483945
Link To Document