• DocumentCode
    3229385
  • Title

    Synergistic physical synthesis for manufacturability and variability in 45nm designs and beyond

  • Author

    Pan, David Z. ; Cho, Minsik

  • Author_Institution
    Univ. of Texas at Austin, Austin
  • fYear
    2008
  • fDate
    21-24 March 2008
  • Firstpage
    220
  • Lastpage
    225
  • Abstract
    Nanometer IC designs are increasingly challenged by manufacturing closure, i.e., being fabricated with high product yield, mainly due to aggressive technology scaling and increasing process/environmental variations. Realizing the criticality of addressing manufacturability for higher yield and tolerance to variations during design, there has been a surge of research activities recently from both academia and industry. In this paper, we will survey the key activities in synergistic physical synthesis and shed lights on some of the future research directions.
  • Keywords
    integrated circuit design; integrated circuit manufacture; IC manufacturing; nanometer IC designs; size 45 nm; synergistic physical synthesis; Design for manufacture; Lithography; Manufacturing industries; Manufacturing processes; Optical interconnections; Optical noise; Process design; Semiconductor device manufacture; Surges; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2008. ASPDAC 2008. Asia and South Pacific
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1921-0
  • Electronic_ISBN
    978-1-4244-1922-7
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2008.4483945
  • Filename
    4483945