• DocumentCode
    3229924
  • Title

    Spurious mode suppression in multiple layer HfO2/Simax acoustical mirror structure for ILAW on 15°-YX LiNbO3

  • Author

    Zhgoon, S. ; Shvetsov, A. ; Bhattacharjee, K.

  • Author_Institution
    Dept. of Radio Eng. Fundamentals, Moscow Power Eng. Inst., Moscow, Russia
  • fYear
    2011
  • fDate
    18-21 Oct. 2011
  • Firstpage
    547
  • Lastpage
    550
  • Abstract
    Cavityless wafer level packaging and TCF improvement are possible with isolated layer acoustic wave (ILAW) with an acoustical mirror structure. Meanwhile orientations of LiNbO3 with high coupling factor that are needed for wideband SAW filters are known to possess spurious modes in the working frequency range. Several attempts with useful outcome have been published for orientations around 15°-YX LiNbO3, the cut angle was also optimized for reduction of the spurious mode coupling factor. This paper investigates the possibility to use the ILAW supporting structure for suppression of spurious modes by exploiting the difference in propagation properties of the waves with different displacement polarization. The results show that the mirror structure with ILAW that is aimed for cavityless wafer level packaging and TCF improvement can simultaneously be used for suppression of the spurious mode in wideband filters.
  • Keywords
    hydrogen compounds; lithium compounds; mirrors; surface acoustic wave filters; wafer level packaging; HfO2; ILAW; LiNbO3; Simax acoustical mirror structure; TCF improvement; cavityless wafer level packaging; isolated layer acoustic wave; spurious mode coupling factor; spurious mode suppression; wideband SAW filters; Acoustic waves; Couplings; Electrodes; Hafnium compounds; Lithium niobate; Resonant frequency; HfO2; ILAW; SAW resonator; SiO2; Simax; cavityless wafer-level packaging; finite element modeling; isolated layer acoustic waves; lithium niobate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2011 IEEE International
  • Conference_Location
    Orlando, FL
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4577-1253-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2011.0132
  • Filename
    6293411