DocumentCode
3231093
Title
The use of optically activated nanoparticles to enhance controlled lesion formation from high intensity focused ultrasound exposures
Author
McLaughlan, James R. ; Murray, Todd W. ; Roy, Ronald A.
Author_Institution
Sch. of Electron. & Electr. Eng., Univ. of Leeds, Leeds, UK
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
2376
Lastpage
2379
Abstract
Light-absorbing nanoparticles can be used to improve the signal-to-noise ratio of the thermoelastic emissions from tissue that are used in photoacoustic tomography (PAT) and microscopy (PAM). Nanoparticles can be functionalized to selectively target cancer cells and destroy them through the formation of vapour bubbles. It has been shown that heating of the nanoparticles with a laser whilst they are simultaneously under tension from a high intensity focused ultrasound (HIFU) field results in a significant reduction in the optical fluence and acoustic pressure thresholds required for bubble formation. The localised heating from HIFU exposures in tissue is believed to be increased through the presence of bubbles, or specifically inertial cavitation, in the focal region. Thus an ability to nucleate vapour bubbles from nanoparticles using laser light combined with a HIFU field presents a unique opportunity for imaging and therapeutic applications.
Keywords
biomedical ultrasonics; cancer; cellular biophysics; nanomedicine; nanoparticles; HIFU; PAM; PAT; acoustic pressure thresholds; controlled lesion formation enhancement; high intensity focused ultrasound; imaging applications; inertial cavitation; light absorbing nanoparticles; localised heating; microscopy; nanoparticle laser heating; optical fluence reduction; optically activated nanoparticles; photoacoustic tomography; signal-to-noise ratio; target cancer cells; therapeutic applications; thermoelastic emissions; vapour bubble formation; Acoustics; Broadband communication; Lasers; Nanoparticles; Phantoms; Transducers; Ultrasonic imaging;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2011 IEEE International
Conference_Location
Orlando, FL
ISSN
1948-5719
Print_ISBN
978-1-4577-1253-1
Type
conf
DOI
10.1109/ULTSYM.2011.0590
Filename
6293469
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