• DocumentCode
    3231588
  • Title

    Ensemble average laser light scattering (EALLS)-an effective alternative to particle counting for monitoring turbidity in ultrapure water [for semiconductor rinsing]

  • Author

    Banerjee, Ashim ; Lambertson, Michael ; Scarpine, Daniel

  • Author_Institution
    Hach Co., Loveland, CO, USA
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    143
  • Lastpage
    148
  • Abstract
    A high sensitivity laser light scattering (LLS) instrument capable of measuring nephelometric turbidity in ultrapure water (UPW) is described. Readings from various stages of the purification process are compared to those from a sophisticated particle counter. Simplicity, ease of use, and relatively low cost, provide EALLS with very significant advantages over particle counters and open the possibility of utilizing several instruments in each UPW loop. Data from such a bank of instruments has the potential for identifying and isolating sources of particulate contamination, thereby enabling significant savings in filter replacement costs as well as down time
  • Keywords
    light scattering; measurement by laser beam; particle size measurement; semiconductor technology; surface cleaning; surface contamination; turbidimetry; ease of use; ensemble average laser light scattering; high sensitivity instrument; nephelometric turbidity; particle counting alternative; particle size; particulate contamination sources; relatively low cost; rinse water; turbidity monitoring; ultrapure water; Costs; Counting circuits; Filters; Instruments; Light scattering; Monitoring; Optical scattering; Particle scattering; Rayleigh scattering; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5217-3
  • Type

    conf

  • DOI
    10.1109/ASMC.1999.798203
  • Filename
    798203