DocumentCode
3231769
Title
Interconnect technology and design implications for future ASIC and system-on-a-chip (SOC) implementations
Author
Gutmann, Ronald J. ; Chan, Kevin ; Graves, Robert J.
Author_Institution
Electron. Agile Manuf. Res. Inst., Rensselaer Polytech. Inst., Troy, NY, USA
fYear
1999
fDate
1999
Firstpage
164
Lastpage
167
Abstract
Back-end-of-the-line (BEOL) interconnect technology is undergoing a rapid transformation as a result of the projected impact on IC performance at decreasing minimum feature sizes. As a result, design complexity is becoming the gating item in leading edge IC products, leading to increasing design reuse of IC functional building blocks (i.e. macrocells and intellectual property (IP) cores), particularly for advanced application specific ICs (ASICs) and system-on-a-chip (SOC) implementations. Virtual Design Environment (VDE) software developed for complex printed circuit boards will expand to the chip level as SOC implementations (and advanced ASICs) incorporate increasing use of IP cores and increasingly complex wiring designs. IC manufacturing operations will become increasingly involved in providing and licensing IP cores in support of this evolving design methodology
Keywords
application specific integrated circuits; cellular arrays; chemical mechanical polishing; circuit CAD; industrial property; integrated circuit design; integrated circuit interconnections; integrated circuit metallisation; integrated circuit yield; software agents; CMP; IC manufacturing operations; IC performance; advanced ASIC implementation; agile manufacturing; back-end-of-the-line interconnect technology; complex wiring designs; design complexity; design reuse; evolving design methodology; functional building blocks; intellectual property; intelligent software agents; macrocells; metallization; patterning; software tools; system-on-a-chip implementation; virtual design environment software; Application software; Application specific integrated circuits; Integrated circuit interconnections; Intellectual property; Macrocell networks; Manufacturing; Printed circuits; Software design; System-on-a-chip; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5217-3
Type
conf
DOI
10.1109/ASMC.1999.798213
Filename
798213
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