DocumentCode
3231876
Title
Reticle layout to maximize focus and throughput
Author
Arena, Philip C.
Author_Institution
Fairchild Semicond., USA
fYear
1999
fDate
1999
Firstpage
188
Lastpage
190
Abstract
Use of a two reticle (product and test) or a combination reticle (containing test and product on one reticle) strategy in production was considered. The quality of the resultant image (focus placement) and throughput were weighed
Keywords
focusing; integrated circuit manufacture; photolithography; reticles; IC production; focus placement; reticle layout; semiconductor manufacturing; throughput maximisation; Contacts; Design optimization; Failure analysis; Focusing; Lithography; Manufacturing; Production; Semiconductor device manufacture; Semiconductor device testing; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5217-3
Type
conf
DOI
10.1109/ASMC.1999.798219
Filename
798219
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