Nanopatterning and the flexible stamp replication using thermal and roll typed UV-NIL

Author

Park, Soo Yeon ; Choi, KeeBong ; Kim, GeeHong ; Lee, JaeJong

Author_Institution

Nano-Mech. Syst. Res. Center, Korea Inst. of Machinery & Mater., Daejeon

fYear

2008

fDate

6-9 Jan. 2008

Firstpage

280

Lastpage

283

Abstract

In case of UV-Nanoimprint Lithography, a transparent quartz stamp with nano-scale patterns has the problems that are difficult to fabricate, handle and keep. Also, it´s very expensive to fabricate nano-scale quartz stamp. Furthermore, according to enlarge the substrate size, these problems will be got out of control. In this paper, flexible and transparent replica stamps are fabricated using the polycarbonate, PDMS and polyurethane acryl films by thermal nano-imprint tools (ANT-6T) in order to get over these problems. To verify these stamps, UV nano-imprint lithography process is executed on the roll typed UV-NIL tools (ANT-6R) which is developed by KIMM.

Keywords

nanolithography; nanopatterning; ultraviolet lithography; ANT-6R; PDMS; flexible stamp replication; nanopatterning; nanoscale patterns; polycarbonate film; polyurethane acryl film; roll typed UV-nanoimprint lithography; thermal UV-nanoimprint lithography; thermal nanoimprint tools; transparent quartz stamp; Control systems; Costs; Engine cylinders; Lithography; Nanolithography; Nanopatterning; Size control; Substrates; Systems engineering and theory; Thermal engineering; PDMS; flexible stamp; polycarbonate; polyurethane; roll typed UV-nanoimprint; thermal nanoimprint;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on

Conference_Location

Sanya

Print_ISBN

978-1-4244-1907-4

Electronic_ISBN

978-1-4244-1908-1

Type

conf

DOI

10.1109/NEMS.2008.4484335

Filename

4484335