Title :
Design and implementation of wafer transporting system for photo lithographer
Author :
Wang, Kai ; Song, Yixu ; Yang, Zehong ; Zhao, Yannan ; Wang, Jiaxin
Author_Institution :
State Key Lab. of Intell. Technol. & Syst., Tsinghua Univ., Beijing
Abstract :
Wafer transporting system is a vital part of IC manufacturing system. This paper presents the design and implementation of the wafer transporting system. Approaches in pre-aligning process and re-locating process are important to the performance of the system. In pre-aligning, Least Square Circle Fitting is adopted to locate the center of the wafer and the notch of the wafer. In re-locating, Section Linear Interpolation is used to calibrate the sensor and special locations of sensors are applied to calculate the wafer eccentricity relative to the fiducially position. The precision of the whole system is very high.
Keywords :
photolithography; semiconductor device manufacture; least square circle fitting; photolithography; pre aligning process; re locating process; wafer transporting system; Charge coupled devices; Design engineering; Fitting; Least squares methods; Manufacturing systems; Mechanical sensors; Optical arrays; Optical devices; Optical sensors; Sensor arrays; IC Manufacturing Equipment; Wafer Pre-align Square Fitting Approach; Wafer Transport;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
DOI :
10.1109/NEMS.2008.4484340